The LPCVD process is a thermally driven organo-metallic process that is configured to deposit multi-layers of silicon dioxide and tantalum pentoxide. LPCVD is a high-temperature process (475˚ C) that provides extremely conformal and seamless coatings on a wide variety of substrates including glass, ceramics, and metals. The unique aspect of the LPCVD process is its capability to uniformly coat all surfaces, even the most complex shapes with a high quality multi-layer optical coating. DSI’s ultra-durable optical coatings also feature laser damage threshold (LDT) levels as high as 25 MW/cm2. These are ideal for use in laser and other high-energy systems such as gas, diode and diode-pumped solid-state (DPSS) systems.